Laboratoire des Sciences des Procédés et des Matériaux - UPR 3407
99 a.v Jean-Baptiste Clément 93430 Villetaneuse

Fax : +33 (0) 1 49 40 34 14

Corinne DULUARD-CURLEY

Maîtresse de Conférences
DMC

corinne.duluard[at]lspm.cnrs.fr@-Code to remove to avoid SPAM-
+33 (0) 1 49 40 34 52

Article dans une revue

2021

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E Bisceglia, Swaminathan Prasanna, K. Gazeli, X. Aubert, C.Y. Duluard, et al.. Investigation of N(4S) kinetics during the transients of a strongly emissive pulsed ECR plasma using ns-TALIF. Plasma Sources Science and Technology, In press, 30, pp.095001. ⟨10.1088/1361-6595/ac0da1⟩. ⟨hal-03059103v3⟩
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https://hal.archives-ouvertes.fr/hal-03059103/file/article%20talif%20ns%20N%2020210413.pdf BibTex
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K. Gazeli, X Aubert, Swaminathan Prasanna, C. Duluard, G. Lombardi, et al.. Picosecond two-photon absorption laser induced fluorescence (ps-TALIF) in krypton: the role of photoionization on the density depletion of the fluorescing state Kr 5p´[3/2]2. Physics of Plasmas, 2021, 28 (4), ⟨10.1063/5.0041471⟩. ⟨hal-03087285v2⟩
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https://hal.archives-ouvertes.fr/hal-03087285/file/Gazeli%20et.%20al%202020_clean.pdf BibTex

2017

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A. Aubert, C. Duluard, N. Sadeghi, A. Gicquel. Comparison of three optical diagnostic techniques for the measurement of boron atom density in a H 2 /B 2 H 6 microwave plasma. Plasma Sources Science and Technology, 2017, 26 (11), ⟨10.1088/1361-6595/aa94d8⟩. ⟨hal-01765999⟩
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2013

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C.Y. Duluard, Thierry Dufour, J Hubert, F Reniers. Influence of ambient air on the flowing afterglow of an atmospheric pressure Ar/O2 radiofrequency plasma. Journal of Applied Physics, 2013, 113 (9), pp.093303. ⟨10.1063/1.4794324⟩. ⟨hal-01303173v2⟩
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https://hal.sorbonne-universite.fr/hal-01303173/file/Pre-Print-013.pdf BibTex

2012

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Thierry Dufour, Julie Hubert, Pascal Viville, C.Y. Duluard, Simon Desbief, et al.. PTFE Surface Etching in the Post-discharge of a Scanning RF Plasma Torch: Evidence of Ejected Fluorinated Species. Plasma Processes and Polymers, 2012, 9 (8), pp.820-829. ⟨10.1002/ppap.201100209⟩. ⟨hal-01303165v2⟩
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https://hal.sorbonne-universite.fr/hal-01303165/file/09_Scientific-Document.pdf BibTex

2011

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Corinne Y. Duluard, Pierre Ranson, Laurianne E. Pichon, Jeremy Pereira, El-Houcine Oubensaid, et al.. Alternating SiCl4/O2 passivation steps with SF6 etch steps for silicon deep etching. Journal of Micromechanics and Microengineering, 2011, 21, pp.065015. ⟨hal-00655003⟩
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2009

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Corinne Y. Duluard, Pierre Ranson, Laurianne E. Pichon, El-Houcine Oubensaid, Jeremy Pereira, et al.. Neutral species in inductively coupled SF6/SiCl4 plasmas. Journal of Physics D: Applied Physics, 2009, 42, pp.115206. ⟨hal-00396438⟩
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El-Houcine Oubensaid, Corinne Y. Duluard, Laurianne E. Pichon, B. Morillon, Mohamed Boufnichel, et al.. Cryogenic etching of n-type silicon with p+ doped walls with the TGZM process through the Al/Si eutectic alloy. Microelectronic Engineering, 2009, 86, pp.2262. ⟨10.1016/j.mee.2009.04.002⟩. ⟨hal-00413753⟩
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El-Houcine Oubensaid, Corinne Y. Duluard, Laurianne E. Pichon, Jeremy Pereira, Mohamed Boufnichel, et al.. Effect of the addition of SF6 and N2 in inductively coupled SiCl4 plasma for GaN etching. Semiconductor Science & Technology, 2009, 24, pp.075022. ⟨10.1088/0268-1242/24/7/075022⟩. ⟨hal-00400936⟩
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J. Pereira, L.E. Pichon, R. Dussart, Christophe Cardinaud, C.Y. Duluard, et al.. In situ x-ray photoelectron spectroscopy analysis of SiOxFy passivation layer obtained in a SF6/O-2 cryoetching process. Applied Physics Letters, 2009, 94 (7), pp.071501. ⟨10.1063/1.3085957⟩. ⟨hal-00432322⟩
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Jeremy Pereira, Laurianne E. Pichon, Remi Dussart, Christophe Cardinaud, Corinne Y. Duluard, et al.. In situ x-ray photoelectron spectroscopy analysis of SiOxFy passivation layer obtained in a SF6/O2 cryoetching process. Applied Physics Letters, 2009, 94, pp.071501. ⟨10.1063/1.3085957⟩. ⟨hal-00365892⟩
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2008

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Corinne Y. Duluard, Remi Dussart, Thomas Tillocher, Laurianne E. Pichon, Philippe Lefaucheux, et al.. SO2 passivating chemistry for silicon cryogenic deep etching. Plasma Sources Science and Technology, 2008, 17, pp.045008. ⟨10.1088/0963-0252/17/4/045008⟩. ⟨hal-00349344⟩
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Communication dans un congrès

2014

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M. Wartel, C. Duluard, X. Aubert, C. Rond, A. Gicquel. Determination of absolute atomic hydrogen densities by Two-Photon Absorption Laser Induced Fluorescence in a H2/CH4 Microwave Plasma at High Pressure and High Microwave Power. Gas Discharge 2014, Jul 2014, Orléans, France. pp.718-721. ⟨hal-01056857⟩
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M. Wartel, C. Duluard, X. Aubert, C. Rond, A. Gicquel. Determination of absolute atomic hydrogen densities by TALIF in a H2/CH4 microwave plasma at high power and high pressure. 9th International Workshop Strong Microwaves and Terahertz Waves, Jul 2014, Volga river, Russia. ⟨hal-01056888⟩
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2013

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M. Wartel, C. Duluard, C. Rond, N. Derkaoui, A. Gicquel. Atomic Hydrogen density and temperature measurements by Two-Photon Absorption Laser Induced Fluorescence in a High Power Density H2/CH4 Microwave Plasma. The XXXI edition of the International Conference on Phenomena in Ionized Gases (ICPIG) 2013, Jul 2013, Grenade, Spain. ⟨hal-01056903⟩
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M. Wartel, C. Rond, N. Derkaoui, C. Duluard, A. Gicquel. Detection of Hydrogen Atoms by Two Photons Absorption Laser Induced Fluorescence in a High Power Density H2/CH4 Microwave Plasma. The 10th Frontiers in Low Temperature Plasma Diagnostics, Apr 2013, Kerkrade, Netherlands. ⟨hal-01056898⟩
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2011

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C.Y. Duluard, Thierry Dufour, J Hubert, F Reniers. Optical diagnostics and mass spectrometry on the afterglow of an atmospheric pressure Ar/O2 radiofrequency plasma used for polymer surface treatment. 30th ICPIG, Aug 2011, Belfast, Ireland. pp.C.10. ⟨hal-01303169v2⟩
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https://hal.sorbonne-universite.fr/hal-01303169/file/Pre-Print-007.pdf BibTex

2009

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Corinne Y. Duluard, Thomas Tillocher, Laurianne E. Pichon, Remi Dussart, Philippe Lefaucheux, et al.. A comparative study on O2 and SO2 passivating chemistry for silicon deep cryogenic etching. AVS 53rd International Symposium & Exhibition, Nov 2009, San Francisco, United States. ⟨hal-00442683⟩
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Jeremy Pereira, Hao Jiang, Laurianne E. Pichon, Remi Dussart, Corinne Y. Duluard, et al.. STiGer cryoetching process of silicon: passivation mechanisms, enhanced robustness and performances. Plasma Etch and Strip in Microelectronics 2nd International Workshop, Feb 2009, Louvain, Belgium. ⟨hal-00444370⟩
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2008

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Jeremy Pereira, Laurianne E. Pichon, Remi Dussart, Corinne Y. Duluard, El-Houcine Oubensaid, et al.. Study of SiOxFy passivation layer deposited in SiF4/O2 ICP discharge. AVS 55th International Symposium & Exhibition, Oct 2008, Boston, United States. ⟨hal-00444361⟩
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2007

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Corinne Y. Duluard, Remi Dussart, Laurianne E. Pichon, Philippe Lefaucheux, Michel Puech, et al.. A study on SF6/SiCl4 inductively coupled plasma by mass spectrometry and optical emission spectroscopy. 16th International Colloquium on Plasma Processes, Jun 2007, France. ⟨hal-00444208⟩
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Corinne Y. Duluard, Remi Dussart, Laurianne E. Pichon, El-Houcine Oubensaid, Philippe Lefaucheux, et al.. Neutral production in SF6/SiCl4 inductively coupled plasmas. 60th Gaseous Electronics Conference, Oct 2007, Arlington, United States. ⟨hal-00444252⟩
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Remi Dussart, Thomas Tillocher, El-Houcine Oubensaid, Philippe Lefaucheux, Pierre Ranson, et al.. Enhanced robustness of the cryogenic process for silicon deep etching. Micro- and Nano-Engineering, Sep 2007, Copenhague, Denmark. ⟨hal-00444248⟩
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Remi Dussart, Philippe Lefaucheux, Pierre Ranson, Laurianne E. Pichon, Corinne Y. Duluard, et al.. Cryoetching of silicon for MEMS and microelectronic components. 16th International Colloquium on Plasma Processes, Jun 2007, France. ⟨hal-00442662⟩
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Remi Dussart, Philippe Lefaucheux, Pierre Ranson, Laurianne E. Pichon, Corinne Y. Duluard, et al.. A new generation of cryogenic processes for silicon deep etching. 60th Gaseous Electronics Conference, Oct 2007, Arlington, United States. ⟨hal-00442668⟩
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Remi Dussart, Laurianne E. Pichon, Corinne Y. Duluard, Philippe Lefaucheux, Mohamed Boufnichel, et al.. SiOxFy film deposited by SiF4/O2 plasma on silicon at low temperature. 16th International Colloquium on Plasma Processes, Jun 2007, Toulouse, France. ⟨hal-00444198⟩
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Laurianne E. Pichon, El-Houcine Oubensaid, Corinne Y. Duluard, Remi Dussart, Philippe Lefaucheux, et al.. A robust passivation-enhanced cryogenic process used for deep silicon etching. AVS 54th International Symposium & Exhibition, Oct 2007, Seattle, United States. ⟨hal-00444264⟩
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Laurianne E. Pichon, Corinne Y. Duluard, Thomas Tillocher, Remi Dussart, Philippe Lefaucheux, et al.. SiOxFy film growth in SiF4/O2 plasma at cryogenic temperature. 18th International Symposium on Plasma Chemistry, Aug 2007, Kyoto, Japan. pp.30P-105. ⟨hal-00444241⟩
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Thèse

2009

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Corinne Y. Duluard. Etude de nouvelles voies de passivation non polymérisante pour la gravure profonde du silicium. Physique [physics]. Université d'Orléans, 2009. Français. ⟨NNT : ⟩. ⟨tel-00413276⟩
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https://theses.hal.science/tel-00413276/file/corinne_duluard.pdf BibTex

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